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刷屏的国产光刻机报道背后的真相

 5 years ago
source link: https://news.cnblogs.com/n/613799/
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文/寿鹏来源:半导体行业观察(ID:icbank)近日,又一篇文章刷爆了半导体人的朋友圈。据军报记者成都报道,国家重大科研装备研制项目“超分辨光刻装备研制”29日通过验收,这是我国成功研制出的世界首台分辨力最高紫外超分辨光刻装备。该光刻机由中国科学院光电技术研究所研制,光刻分辨力达到22

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